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Description

Polo cuello redondo a rayas

Composición: 94%POLIESTER

sku: O26BUJN013

Cuidado de la prenda: *LAVAR A MAQUINA *LAVAR MÁXIMO A 30° *NO USAR BLANQUEADOR *NO USAR SECADORA *PLANCHA TIBIA *LAVAR POR SEPARADO*NO DEJAR EN REMOJO

con print en el delantero y trasero

Chompa New Cleo Print 2 cyber_wow_50 Polo cuello redondo a rayasComposicin: 50% COTTON, 50% ACRYLIC. Cuidado de la prenda: *LAVAR A MAQUINA *LAVAR MXIMO A 30 *NO USAR BLANQUEADOR *NO USAR SECADORA *PLANCHA TIBIA *LAVAR POR SEPARADO. sku: O26MLHI004

Exchange/Return Notes
  • We offer a 30-day return/exchange service after receiving.
  • Final sale items are not eligible for returns or exchanges.
  • To process your return/exchange, please contact us at [email protected]
  • Please click here for more details>>> Return & Exchange Policy

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